Please convert the given below text into rendered equations without any errors.Got it ? I’ll solve **all questions step-by-step**, clearly and neatly, using the given data. --- # **CHEG 5023 – Microelectronics Materials Homework-2 : Complete Step-by-Step Solutions** --- ## **Q1. Show that ( pn = N_c N_v e^{-E_g/kT} ). Prove that ( pn = n_i^2 )** ### **Step 1: Electron concentration** [ n = N_c e^{-(E_c - E_F)/kT} ] ### **Step 2: Hole concentration** [ p = N_v e^{-(E_F - E_v)/kT} ] ### **Step 3: Multiply (n) and (p)** [ pn = N_c N_v e^{-(E_c - E_v)/kT} ] But, [ E_c - E_v = E_g ] [ \boxed{pn = N_c N_v e^{-E_g/kT}} ] --- ### **Step 4: Definition of intrinsic carrier concentration** [ n_i = \sqrt{N_c N_v} e^{-E_g/2kT} ] Squaring: [ n_i^2 = N_c N_v e^{-E_g/kT} ] [ \boxed{pn = n_i^2} ] ✔ **Proved** --- ## **Q2. Fraction of conduction in intrinsic Si due to electrons** ### **Given** * Conductivity: [ \sigma = q(n\mu_n + p\mu_p) ] * Intrinsic silicon ⇒ (n = p = n_i) ### **Step 1: Electron fraction** [ \text{Electron fraction} = \frac{n\mu_n}{n\mu_n + p\mu_p} ============================== \frac{\mu_n}{\mu_n + \mu_p} ] ### **Step 2: Substitute** [ \mu_n = 1900,\quad \mu_p = 425 ] [ \frac{1900}{1900 + 425} ======================= \frac{1900}{2325} = 0.817 ] [ \boxed{\text{Electron contribution} \approx 81.7%} ] --- ## **Q2(b). Boron concentration to increase conductivity to 0.1 (Ω·cm)(^{-1})** ### **Step 1: Conductivity in p-type Si** [ \sigma = q p \mu_p ] ### **Step 2: Solve for (p)** [ p = \frac{\sigma}{q\mu_p} ] [ p = \frac{0.1}{(1.6\times10^{-19})(425)} ] [ p = 1.47 \times 10^{15},\text{cm}^{-3} ] [ \boxed{N_A \approx 1.5 \times 10^{15},\text{cm}^{-3}} ] --- ## **Q2(c). Dominant carrier** Since boron doping → **p-type**, [ \boxed{\text{Holes dominate}} ] --- ## **Q3. Si wafer with (10^{14},\text{cm}^{-3}) dopants** ### **Given** [ n_i = 1.45\times10^{10},\text{cm}^{-3} ] --- ### **(a) Boron doped (p-type)** #### **Step 1: Carrier concentrations** [ p \approx N_A = 10^{14} ] [ n = \frac{n_i^2}{p} =================== \frac{(1.45\times10^{10})^2}{10^{14}} = 2.1\times10^{6} ] --- #### **Step 2: Conductivity** [ \sigma = q(p\mu_p + n\mu_n) ] [ \sigma \approx (1.6\times10^{-19})(10^{14})(425) = 6.8\times10^{-3} ] --- #### **Step 3: Resistivity** [ \rho = \frac{1}{\sigma} = 147,\Omega\cdot\text{cm} ] --- #### **Step 4: Fermi level** [ E_F - E_i = -kT \ln\left(\frac{p}{n_i}\right) ] [ = -0.026 \ln\left(\frac{10^{14}}{1.45\times10^{10}}\right) = -0.23,\text{eV} ] --- ### **(b) Phosphorus doped (n-type)** [ n \approx 10^{14} ] [ p = \frac{n_i^2}{n} = 2.1\times10^{6} ] [ \sigma = (1.6\times10^{-19})(10^{14})(1900) = 0.0304 ] [ \rho = 32.9,\Omega\cdot\text{cm} ] [ E_F - E_i = +0.23,\text{eV} ] --- ## **Q4. Carrier concentration, conductivity & Fermi level** --- ### **(a) Boron concentration (10^{15},\text{cm}^{-3})** [ p = 10^{15} ] [ n = \frac{n_i^2}{p} = 2.1\times10^{5} ] [ \sigma = (1.6\times10^{-19})(10^{15})(425) = 0.068 ] [ E_F - E_i = -0.026\ln\left(\frac{10^{15}}{1.45\times10^{10}}\right) = -0.29,\text{eV} ] --- ### **(b) Phosphorus concentration (10^{15},\text{cm}^{-3})** [ n = 10^{15} ] [ p = 2.1\times10^{5} ] [ \sigma = (1.6\times10^{-19})(10^{15})(1900) = 0.304 ] [ E_F - E_i = +0.29,\text{eV} ] --- ## ✅ **Final Summary Table** | Case | Dominant Carrier | Conductivity (Ω⁻¹cm⁻¹) | Fermi Level Shift | | ------------ | ---------------- | ---------------------- | ----------------- | | Intrinsic | Electrons | – | At (E_i) | | B: (10^{14}) | Holes | 0.0068 | −0.23 eV | | P: (10^{14}) | Electrons | 0.030 | +0.23 eV | | B: (10^{15}) | Holes | 0.068 | −0.29 eV | | P: (10^{15}) | Electrons | 0.304 | +0.29 eV | --- If you want, I can also: * Convert this into **exam-ready answers** * Create a **one-page formula sheet** * Or explain **Fermi level shifts visually** Just tell me ?
Question:
Please convert the given below text into rendered equations without any errors.Got it ? I’ll solve **all questions step-by-step**, clearly and neatly, using the given data. --- # **CHEG 5023 – Microelectronics Materials Homework-2 : Complete Step-by-Step Solutions** --- ## **Q1. Show that ( pn = N_c N_v e^{-E_g/kT} ). Prove that ( pn = n_i^2 )** ### **Step 1: Electron concentration** [ n = N_c e^{-(E_c - E_F)/kT} ] ### **Step 2: Hole concentration** [ p = N_v e^{-(E_F - E_v)/kT} ] ### **Step 3: Multiply (n) and (p)** [ pn = N_c N_v e^{-(E_c - E_v)/kT} ] But, [ E_c - E_v = E_g ] [ \boxed{pn = N_c N_v e^{-E_g/kT}} ] --- ### **Step 4: Definition of intrinsic carrier concentration** [ n_i = \sqrt{N_c N_v} e^{-E_g/2kT} ] Squaring: [ n_i^2 = N_c N_v e^{-E_g/kT} ] [ \boxed{pn = n_i^2} ] ✔ **Proved** --- ## **Q2. Fraction of conduction in intrinsic Si due to electrons** ### **Given** * Conductivity: [ \sigma = q(n\mu_n + p\mu_p) ] * Intrinsic silicon ⇒ (n = p = n_i) ### **Step 1: Electron fraction** [ \text{Electron fraction} = \frac{n\mu_n}{n\mu_n + p\mu_p} ============================== \frac{\mu_n}{\mu_n + \mu_p} ] ### **Step 2: Substitute** [ \mu_n = 1900,\quad \mu_p = 425 ] [ \frac{1900}{1900 + 425} ======================= \frac{1900}{2325} = 0.817 ] [ \boxed{\text{Electron contribution} \approx 81.7%} ] --- ## **Q2(b). Boron concentration to increase conductivity to 0.1 (Ω·cm)(^{-1})** ### **Step 1: Conductivity in p-type Si** [ \sigma = q p \mu_p ] ### **Step 2: Solve for (p)** [ p = \frac{\sigma}{q\mu_p} ] [ p = \frac{0.1}{(1.6\times10^{-19})(425)} ] [ p = 1.47 \times 10^{15},\text{cm}^{-3} ] [ \boxed{N_A \approx 1.5 \times 10^{15},\text{cm}^{-3}} ] --- ## **Q2(c). Dominant carrier** Since boron doping → **p-type**, [ \boxed{\text{Holes dominate}} ] --- ## **Q3. Si wafer with (10^{14},\text{cm}^{-3}) dopants** ### **Given** [ n_i = 1.45\times10^{10},\text{cm}^{-3} ] --- ### **(a) Boron doped (p-type)** #### **Step 1: Carrier concentrations** [ p \approx N_A = 10^{14} ] [ n = \frac{n_i^2}{p} =================== \frac{(1.45\times10^{10})^2}{10^{14}} = 2.1\times10^{6} ] --- #### **Step 2: Conductivity** [ \sigma = q(p\mu_p + n\mu_n) ] [ \sigma \approx (1.6\times10^{-19})(10^{14})(425) = 6.8\times10^{-3} ] --- #### **Step 3: Resistivity** [ \rho = \frac{1}{\sigma} = 147,\Omega\cdot\text{cm} ] --- #### **Step 4: Fermi level** [ E_F - E_i = -kT \ln\left(\frac{p}{n_i}\right) ] [ = -0.026 \ln\left(\frac{10^{14}}{1.45\times10^{10}}\right) = -0.23,\text{eV} ] --- ### **(b) Phosphorus doped (n-type)** [ n \approx 10^{14} ] [ p = \frac{n_i^2}{n} = 2.1\times10^{6} ] [ \sigma = (1.6\times10^{-19})(10^{14})(1900) = 0.0304 ] [ \rho = 32.9,\Omega\cdot\text{cm} ] [ E_F - E_i = +0.23,\text{eV} ] --- ## **Q4. Carrier concentration, conductivity & Fermi level** --- ### **(a) Boron concentration (10^{15},\text{cm}^{-3})** [ p = 10^{15} ] [ n = \frac{n_i^2}{p} = 2.1\times10^{5} ] [ \sigma = (1.6\times10^{-19})(10^{15})(425) = 0.068 ] [ E_F - E_i = -0.026\ln\left(\frac{10^{15}}{1.45\times10^{10}}\right) = -0.29,\text{eV} ] --- ### **(b) Phosphorus concentration (10^{15},\text{cm}^{-3})** [ n = 10^{15} ] [ p = 2.1\times10^{5} ] [ \sigma = (1.6\times10^{-19})(10^{15})(1900) = 0.304 ] [ E_F - E_i = +0.29,\text{eV} ] --- ## ✅ **Final Summary Table** | Case | Dominant Carrier | Conductivity (Ω⁻¹cm⁻¹) | Fermi Level Shift | | ------------ | ---------------- | ---------------------- | ----------------- | | Intrinsic | Electrons | – | At (E_i) | | B: (10^{14}) | Holes | 0.0068 | −0.23 eV | | P: (10^{14}) | Electrons | 0.030 | +0.23 eV | | B: (10^{15}) | Holes | 0.068 | −0.29 eV | | P: (10^{15}) | Electrons | 0.304 | +0.29 eV | --- If you want, I can also: * Convert this into **exam-ready answers** * Create a **one-page formula sheet** * Or explain **Fermi level shifts visually** Just tell me ?
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Created at: 2026-02-17 09:58:03
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